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>> Influence of oxygen argon ratio on the structural, electrical，optical and thermoelectrical properties of Al-doped ZnO thin films
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Influence of oxygen argon ratio on the structural, electrical，optical and thermoelectrical properties of Al-doped ZnO thin films
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Release time:2018-11-04
Affiliation of Author(s):
理学院
Title of Paper:
Influence of oxygen argon ratio on the structural, electrical，optical and thermoelectrical properties of Al-doped ZnO thin films
Journal:
Physica E
Key Words:
Al-doped ZnO thin films; Oxygen argon ratio; Structural and optical properties; Electrical and thermoelectrical properties
Document Code:
t26wok5v-vk15-yb8l-6jl2-izk8ama1f3zt
Volume:
41
Issue:
1
ISSN No.:
1386-9477
Translation or Not:
no
Date of Publication:
2008-01-01
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Effect of annealing treatment on the structural, optical, and electrical properties of Al-doped ZnO thin films
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尖晶石结构材料的最新研究进展
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